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We
produce photomasks in various ranges of precision in order to respond
to any request from our customers. Our team will advise you on the manufacturing process of your photomask to ensure an adapted product to your requirements. Field of application Photomasks produced in our company are used worldwide in high tech fields such as indusrty of the printed circuits, watches, petroleum, aerospace and aeronautic. Technical data •Photomask on film substrate Layer: photoemulsion. Max. size: 710 x 810 mm Min. structure: 10 microns. Precision :± 15 microns on 750 mm •Photomask on glass substrate Layer: photoemulsion. Max. size: 710 x 810 mm Layer: chrom. Max. size: 300 x 300 mm Min. structure: 2 microns. Precision : ± 1 microns on 100 mm |
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| Photomask |
| Selba S.A 9-11 Ch. Ami- Argand 1290 Versoix Switzerland Tel. ++ 41 22 775 33 50 Fax. ++ 41 22 775 33 51 info@selba.ch |